International Archives of the Photogrammetry, Remote Sensing and Spatial Information Sciences, Vol XXXV, Part B2. Istanbul 2004 
The exposure conditions for specific materials were determined 
on the basis of their exposure under various filters. An example 
of exposure selection is presented in Fig. 3. 
  
  
    
35 T T Y T T T T T T T T T | T T T T ST 
   
S material: Kodak 3412 
proces: Kodak 885; t-48s; T-30'C 
   
    
— Filtr 50 
—Fittr 100 
Fittr 200 
— Filtr 400 
        
  
3,04 
     
  
2,5 4- 
  
2,0 4+— 
  
  
  
  
  
  
  
  
  
j -1 
LogH 
Fig. 3. Characteristic curves of Kodak 3412 material obtained 
using a set of five filters. In this case, the exposure of H=2,13 
lux s (LogH=-1,38) was selected. 
For every test the tested material was exposed three times using 
21-step tablet. The values of the exposure under each of the log 
H fields were calculated according to the formula in Fig. la. 
The prepared materials were then processed in Kodak Versamat 
1140 and Russian PM-32 processors. The processing was con- 
ducted in solutions listed in Table 4. 
Table 4. Listing of films processing in Versamat 1140 and PM- 
32 processors. 
  
  
  
  
  
  
  
  
  
  
  
FILM Filtr UP [| UP | UP | AGF 885 
-5 -6 | Bl | A74c 
Typ 38 F/2,13 X X X 
Typ 42 F/1 X X X X 
Typ 42L F/1 > X x x 
Kodak F/2.13 X X X X 
3412 
Kodak F/1 x X X X 
3404 
Kodak F/l X X X 
SO-50 
Agfa Pan | F/2,13 X X X X X 
80 
Agfa Pan | F/l X X X X 
200 
Agfa Pan | F/I X X X 
400s 
Foma 200 | F/l X X X X X 
  
  
  
  
  
  
  
  
  
3. STUDY OF THE KINETICS OF THE DEVELOPMENT 
PROCESS AND DETERMINATION OF THE BASIC 
SENSITOMETRIC QUANTITIES 
Development was conducted in various temperatures 24 °C - 40 
"C. To study the kinetics of the development of the specific 
photographic materials in each of the processes, the speed of 
the film transportation in the processor was changed which 
resulted in the change of development, fixing and drying time 
for the processed material. Sensitograms obtained due to 
exposing and processing were subject to densitometric 
measurements by means of a Macbeth densitometer and as a 
result the values of optical density for the specific fields were 
obtained. Using the measured values of optical density and 
absolute values of exposures for the specific fields, the 
characteristic curves were obtained (Fig. 5). 
  
  
  
  
  
  
  
3,5 T T T T T : + 
| | | + 
71! materiat: Kodak 3412 Z^ 1 
proces: Kodak 885; T=30°C "hi 
3,0 7 — 
- 7 - 
czas wywolywania: / ral 
— [96s / 
2.8 — (2408 y 7 
200 t=12s / 
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
  
WU i / y 
Sid / J 
1,5 a] 
1,0 
0,5 
bo SE ME | ; ; T T 
-3,0 -2,5 -2,0 -1,5 -1,0 -0,5 0,0 0,5 
LogH 
24 T T T ES T T T 
204 NS 
16 J TRAY 
// J \ \ 4 
12 Jj N 
u / / NIS 
+ J N J 
08 / / M 
04 
00... ; ; 
30 05/0 100: 1:05 
  
Fig. 5. Impact of the development time on the shape of the 
characteristic curve and distribution of the local gradient for 
Kodak 3412 material processed in Kodak 885 (T=30°C) 
process. 
The characteristic curves were used to obtain the basic 
sensitometric properties (according to ISO 7829 and the 
Russian GOST norms). 
Examples of the results obtained during the study are presented 
on the graph of g47f(SisoA) in Fig. 6. 
Intern 
  
4. AP 
The qual 
sensitome 
graph is | 
the study 
a polynoi 
appropria 
was provi 
21-step të 
further in 
the result 
Examples 
225 - 
220 - 
215 
235 - 
230 - 
225 - 
220 -