Full text: Fortschritte in der Metallographie

228 
> Em va Sr 
5 [5 du v1 sp; 
- Mn 00-400 3 
. Le x 
Zi —_-—>—— N 0-10 % DI 
7f 
6: 
so 
5 x Be 
‚38. Er SSer de: 
‚20 np en che 
el . Current (aA): 0 in 
15 [Comenta ein 
„1040 | a kı 
‚05 AA 
00 LI 4 55 a8 m 
Depth (microns) 
Bild 12: GDOS-Tiefenprofil, X5X0CrMnNiNbN 21 9, TF1/AB1-Behandlung DL 
Ar 
als 
. IElenent Percent. du 
X m C 0-403 
e DE cm Pu 
, LIE S 
© + N 0-40 % da: 
: fid 
& x 
En 'Be 
BE nn Ivoltage (V): 671 © 
‚20° \ 7 Current (mA): 28 1% 
Us Ba ; 
„05 ; PNT 0ir.6) b 
‚09 + EEE EEE EEE EEE + —— 
10 13 20 25 30 - 
Depth (micrens) L 
Bild 13: GDOS-Tiefenprofil, X50CrMnNiNbN 21 9, PNT-Behandlung 
Te 
Di 
de: 
wı 
tur 
Fü 
mi 
sch 
de 
Er 
Di 
re:
	        
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