Prakt. Met. Sonderband 46 (2014) 31
Another possibility not shown here is to prepare a thin lamella across the film on substrate
by repeating the process shown in Fig. 2 from the other side as well, as demonstrated
ation of a material cross- recently elsewhere [25]. Such lamellas, where the film of interest is on top of the prepared
al etching, since corners lamella, can serve as pre-form for shaping bending beams in the FIB to measure stresses
"|B, such cross-sections in the thin films, an example of which is shown below.
beam ion milling, large
ar to the material surface
in Fig. 2, the sample is 2.2.3 MASK-STRUCTURED MICROSAMPLES
Oo sputter a cross-section
icture and film/substrate Finally, once a free-standing lamella was created by either electrochemical etching or
broad beam ion slicing (Fig. 4a), in the next step the sample can be rotated by 90° and a
protecting stencil mask put in place on top (b), after which another ion milling process is
performed (c), similar to what was suggested in [26]. This then allows the FIB-less creation
of micro-samples (Fig. 4d).
a) Ar be-
film on substrate.
n milling. However, when
to prepare free standing
on substrates this can in
strate [24]. However, the
kind of film/substrate as
area of interest) with the
rge free-standing lamella Fig. 4: Preparation of micro-tensile samples using stencil masks during broad ion beam
uring (c, d). For very thin sputtering of a previously thinned lamella.
ge of the film.
Notably, this approach is limited to somewhat larger samples sizes in the upper
micrometer regime. Nonetheless, this is a very exciting range that is typically only
accessible by lithographic techniques, as it is too small for conventional machining, and
too large or very ineffective for FIB machining. Given the limited flexibility of lithographic
processes with respect to the used materials, we think that this mask supported broad
beam ion milling approach, which can be applied to literally any kind of material that
tolerates vacuum and low energy Ar ion impact, is definitely a very valuable sample
fabrication strategy.
2.3 FOCUSSED ION BEAM MILLING
In the following paragraphs, we will detail the steps to prepare miniaturized samples with
well defined geometries [19, 27-30], and in particular without the taper, which is typical for
many of these micro-samples [31]. Needles or lamellas, fabricated in the previous steps.
will serve as pre-forms.
hat can subsequently be