10 Prakt. Met. Sonderband 47 (2015)
5 Outlook
Novel X-ray optics, particuarly a combination of advanced illumination optics and novel mulitlayer
Laue lenses in an X-ray microscopy enable the application of photon energies E > 10 keV for full-
field X-ray microscopy at high spatial resolution using laboratory X-ray sources (e.g. Mo-Ka, E =
17.5 keV). Thus, future application is in particular seen in high-resolution investigations of iron-
based materials and non-destructive analysis of microelectronics processes and products [5,16].
First experimental results were achieved with a demonstrator setup, using a commercial microfocus
Cu X-ray tube and an ordinary X-ray camera. Though the performance of source and detector limits
the imaging capabilities, the influence of the illumination was studied, and radiographs were
acquired [7,8]. In addition to the task to reduce the measurement time and consequently the time-to-
data, and to improve the spatial resolution, future work will concentrate on the application of higher
photon energies to be able to study larger samples, e. g. wafers at their original thickness or
complete 3D IC stacks with this method.
This work was partially funded by the European Union (ERDF) and the Free State of Saxony via
the ESF project 100087859 ENano.
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