Full text: Fortschritte in der Metallographie

Prakt. Met. Sonderband 52 (2018) 53 
m x 
a [25] S. Fackler, V. Alexandrakis, D. Koenig, A. Kusne, T. Gao, M. Kramer, D. Stasak, K. 
Sra Lopez, B. Zayac, A. Mehta, A. Ludwig, |. Takeuchi (2017) Combinatorial study of Fe- 
Galla, Hy Sov hard magnetic thin films, Science and Technology of Advanced Materials, 18:1, 
3 ' =. = 
Sos [26] V. Alexandrakis, W. Wallisch, S. Hamann, G. Varvaro, J. Fidler, A. Ludwig (2015) 
30, Combinatorial development of Fe-Co-Nb thin film magnetic nanocomposites, ACS 
a Combinatorial Science 17, 698-703 
frac of [27] A. Dias, G. Gomez, D. Givord, M. Bonfim, N. M. Dempsey (2017) Preparation and 
a and characterisation of compositionally graded SmCo films, AIP Advances 7, 056227 
Yang [28] D. Konig, R. Zarnetta, A. Savan, H. Brunken, A. Ludwig (2011), Phase 
SYS by transformation, structural and functional fatigue properties of Ti-Ni-Hf shape memory 
st thin films, Acta Materialia 59, 3267-3275. 
N od [29] J. Cui, Y. Chu, 0.0. Famodu, Y. Furuya, J. Hattrick-Simpers, R.D. James, A. Ludwig, 
. Mater, 12 S. Thienhaus, M. Wuttig, Z. Zhang, |. Takeuchi (2006), Combinatorial search of 
h thermoelastic shape memory alloys with extremely small hysteresis width, Nature 
Y-hroughput Materials 5, 286-290. 
in films at [30] S. Hamann, M. Ehmann, S. Thienhaus, A. Savan, A. Ludwig (2008), Micro-hotplates 
465. | for high-throughput thin film processing and in situ phase transformation 
trough characterization, Sensors and Actuators A, 147, 576 - 582. 
Miever aay [31] X. Wang, D. Rogalla, A. Ludwig (2018) Influences of W content on the phase 
uments 82. transformation properties and the associated stress change in thin film substrate 
combinations studied by fabrication and characterization of thin film Vi.WxO: 
dig (2018) materials libraries, ACS Combi. Sci. 20, 229-236 
1S n physical [32] A. Ludwig, J. Cao, B. Dam, R. Gremaud (2007), Opto-mechanical characterization of 
ators A 270, hydrogen storage properties of Mg—Ni thin film composition spreads, Applied Surface 
Science 254, 682-686. 
 H. Brunken, [33] A. Ludwig, J. Cao, A. Savan, M. Ehmann (2007), High-throughput characterization of 
P-hroughput hydrogen storage materials using thin films on micromachined Si substrates, Journal 
i ACrN thin of Alloys and Compounds, 446-447, 516-521. 
[34] S. Burger, C. Eberl, A. Siegel, A. Ludwig, O. Kraft (2011), A Novel High-Throughput 
combinatorial Fatigue Testing Method for Metallic Thin Films, Sci. Technol. Adv. Mater. 12 054202 
Technol, 16, [35] M.Wambach, R. Stern, S. Bhattacharya, P. Ziolkowski, E. Miller, G.K.H. Madsen, A. 
Ludwig (2016) Unraveling Self-Doping Effects in Thermoelectric TiNiSn Half-Heusler 
(2014) Rapid Alloys by combined Theory and High-Throughput Experiments, Advanced Electronic 
y Combining Materials, Vol. 2, Iss. 2, Article Number: UNSP 1500208 
n-Throughput [36] Q. d’Acremont, G. Pernot, J.-M. Rampnoux, A. Furlan, D. Lacroix, A. Ludwig, S. 
6 686-694 Dilhaire (2017) High-throughput heterodyne thermoreflectance: Application to 
ig, ‘Wolfgang thermal conductivity measurements of a Fe-Si-Ge thin film alloy library, Review of 
“tor materials Scientific Instruments 88, 074902 
hem. 8.1270 [37] K. Alberi, M. Buongiorno Nardelli, A. Zakutayev, L. Mitas, S. Curtarolo, A. Jain, M. 
Fornari, N. Marzari, |. Takeuchi, M. Green, M. Kanatzidis, M. Toney, S. Butenko, B. 
h-roughpu Meredig, S. Lany, U. Kattner, A. Davydov, E. Toberer, V. Stevanovic, A. Walsh, N. 
tion of Fe-W- G. Park, A. Aspuru-Guzik, D. P. Tabor, J. Nelson, J. Murphy, A. Setlur, J. Gregoire, 
H. Li, R. Xiao, A. Ludwig, L. Martin, A. Rappe, S.-H. Wei, J. Perkins (2018) The 2018 
mann (2017) Materials by Design Roadmap, accepted by J. Phys. D: Appl. Phys. 
min BiV-Mo- [38] Y.J.Li, A. Savan, A. Kostka, H. S. Stein, A. Ludwig (2018) Accelerated atomic-scale 
2 exploration of phase evolution in compositionally complex materials, Materials 
(2017) High- Horizons 5, 86 — 92 
arials system [39] Y. Li, A. Kostka, A. Savan, A. Ludwig (2018) Atomic-scale investigation of fast 
oxidation kinetics of nanocrystalline CrMnFeNiCo thin films, accepted by J. Alloys 
and Compounds
	        
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