Results of the chemical composition of pulse laser deposition (PLD) produced Co-Cu fourfold 
layers with a nominal single layer thickness of 8 nm are given in Figure 6. Figure 6a shows a set of 
50 EEL spectra taken along the layer normal direction. The net edge intensities of Co-L and Cu-L 
were calculated after background subtraction (11). As the corresponding concentration profiles in 
Figure 6b show, the Cu intensity in the Co layer increases with growing distance s from the 
substrate side. 
minating surface 
ulk systems are 
th of electron- nergy fom = 
stance (GMR) at a ) ‘ 
a 4000+ 
was (ols Co-Cu mixing! 
See A Co . 
layer thickness 3000{ © 
igated by energy | 9 _ 
mages wih a x © Cu 
ter (Figure Sk .- 200 N 
ngs one can : iy 2 
gs and also the a 7 
ltilayer structure, = 4000 ¥ 
exist at ie 
0 
0 5 10 15 20 25 30 35 40 
b) s/nm 
Figure 6: Chemical composition of pulse laser deposited Co-Cu fourfold nanolayers 
(nominal thickness 8 nm) 
(a) set of 50 EEL spectra along the layer normal direction 
(b) corresponding concentration profiles of the calculated Co and Cu intensities 
15