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device to
CA—M camera also has a printing
imprint into the frame intervals the photometric wedge
illuminated by reference light source. This device
guarantees the accuracy of photometric measurement on
multispectrai images.
The device design provides for photometric wedge
and surveyed area exposure by the same time of
exposure and this excludes the influence of
non-interchangebi1ity effect (SchwarzschieId Law),
which is of great importance for guaranting the
required accuracy of photometrical measurements.
Technical specifications of the photometrical
wedge imprinting device
Wedge wid t h —
Wedge constant —
Minimum optical density-
Wedge image densities
deviation of standartized
values —
Difference of inter—zones
wedge image density values -
Stability of shutter operation
Deviation of light intensity
of the rerference light source
6 mm
0.01mm
0.1 D un-
less than 15 %
less than 5 %
- 0.5%
—less than 1 %
The compensation of the image shift is made by
linear method, i.e. a displacement of photofilm at
the accuracy of 3%.
The aperture interlense CA—M camera shutter
provide for film sensitivity layer exposure in the
frame field and exposure of the image of photometric
wedge in the interframe interval for all 4 channels.